Optical performance of ultra-thin silver films under the attenuated total reflection mode
Ming ZHOU1,*,Sheng ZHOU1,Gang CHEN1,Yaopeng LI1,Dingquan LIU1,2 |
1. Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China 2. School of Physical Science and Technology, ShanghaiTech University, Shanghai 200031, China |
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Abstract
Ultra-thin silver films were deposited by thermal evaporation, and the dielectric functions of samples were simulated using Drude-Lorentz oscillators. When s-polarized incident light from the BK7 glass into thin silver film at 45° angle using attenuated total reflection (ATR) mode, we experimental observed that the reflection reach a minimum of 1.87% at 520 nm for thickness of d~6.3 nm silver film, and it reach a minimum of 10.1% at 500 nm for thickness of d~4.1 nm. Moreover, we simulated the absorption changes with incident angles at 520 nm for both p-polarized (TM wave) and s-polarized (TE wave) light using transfer matrix theory, and calculated the electric field distributions. The absorption as a function of incident angles of TM wave and TE wave showed different characteristics under ATR mode, TE wave reached the maximum absorption around the critical angle θc~41.1°, while TM wave reached the minimum absorption.
Cite this article: |
Ming ZHOU,Sheng ZHOU,Gang CHEN, et al. Optical performance of ultra-thin silver films under the attenuated total reflection mode[J]. Front. Optoelectron., 27 June 2016. [Epub ahead of print] doi: 10.1007/s12200-016-0574-7. |